Identification of radicals responsible for DNA cleavage by photolysis of bis-oxime esters

Jih Ru Hwu; Shwu-Chen Tsay; Shih Ching Hung; Ming-Hua Hsu; Ji-Yuan Ma; Vojislav V. Mitic; Goran Lazovic; Shang-Shing P. Chou

doi:10.1515/9783110627992-008

Book chapter

Identification of radicals responsible for DNA cleavage by photolysis of bis-oxime esters

Jih Ru Hwu, Shwu-Chen Tsay, Shih Ching Hung, Ming-Hua Hsu, Ji-Yuan Ma, Vojislav V. Mitic, Goran Lazovic and Shang-Shing P. Chou

Advanced Ceramics and Applications, pp.101-108

01/2021

DOI: https://doi.org/10.1515/9783110627992-008

Appears in keyword about Physics

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Newly synthesized 9, 10-anthraquinone and acenaphthene-1, 2-dione derivatives exhibited high potency for DNA scission under photolytic conditions at concentrations of 37 and 6.5 μM, respectively. Results from electron paramagnetic resonance (EPR) experiments reveal that the benzoyloxy radicals and their degraded aryl radical intermediates (rather than bis-iminyl radicals) were mostly responsible for the DNA cleavage.

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Title: Identification of radicals responsible for DNA cleavage by photolysis of bis-oxime esters
Translated title: Identification of radicals responsible for DNA cleavage by photolysis of bis-oxime esters
Creators - without role: Jih Ru Hwu - Department of Chemistry , National Tsing Hua University , Frontier Research Center on Fundamental and Applied Sciences of Matters
Shwu-Chen Tsay - National Tsing Hua University
Shih Ching Hung - Department of Chemistry , National Tsing Hua University , Frontier Research Center on Fundamental and Applied Sciences of Matters
Ming-Hua Hsu - Department of Chemistry , National Tsing Hua University , Frontier Research Center on Fundamental and Applied Sciences of Matters
Ji-Yuan Ma - Fu Jen Catholic University
Vojislav V. Mitic - University of Nis
Goran Lazovic - University of Belgrade - Faculty of Mechanical Engineering
Shang-Shing P. Chou - Fu Jen Catholic University
Publication Details: Advanced Ceramics and Applications, pp.101-108
Identifiers: 9783110627992; 9783110625134; 9957766843606774
Academic Unit: National Tsing Hua University
Language: English
Resource Type: Book chapter

Identification of radicals responsible for DNA cleavage by photolysis of bis-oxime esters

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