Abstract
For students, new and experienced engineers, technology managers, and senior technicians who want to learn more about the image formation physics of a lithographic system, Lin (optical lithography, National Taiwan U.), who works in microlithography and is editor of the Journal of Micro/Nanolithography, MEMS, and MOEMS, explains the basic equations and constants of optical lithography, the basics of exposure systems and image formation, and system components, processing, and optimization. He explains the reasons and principles behind the techniques used and covers the metrics of lithography, hardware components, immersion lithography, successors to optical lithography, and principles of photoresists, processing windows, phase-shifting masks, off-axis illumination, proximity correction, EUV lithography, and multiple e-beam maskless lithography.