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XPEEM studies using a polarized photon source
Book chapter

XPEEM studies using a polarized photon source

Y. J. Hsu and D. H. Wei
NSRRC/Activity Report 2002/2003, p.83
2003

Abstract

XPEEM;polarized photon source
X-ray Photoemission Electron Microscopy (XPEEM) is a powerful tool for surface and material sciences because it not only provides the images with versatile contrasts but also leads the NEXAFS spectroscopy into a micrometer dimension analysis technique. Coupling with a polarized photon source, the XPEEM can take advantage of the additional degree of freedom in polarization control to explore those photon-material interactions that show unidirectional or uniaxial anisotropy. In this article, we introduce two examples utilizing a polarized photon source provided by an elliptically polarized undulator (EPU) to study the magnetic domain configurations for patterned permalloy structures and the area selective orientation control of pentacene on a selfassembled monolayer (SAM)-patterned Au surface.

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