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215W pulsed class A UHF power amplification based on SiC bipolar technology
Conference paper

215W pulsed class A UHF power amplification based on SiC bipolar technology

Chih-Fang Huang, I. Perez, Feng Zhao, J. Torvik, R. Irwin, K. Torvik, F. Abrhaley and B. Van Zeghbroeck
Device Research Conference, 2004, 62nd DRC, Conference Digest
2004

Abstract

Pulse amplifiers;Silicon carbide;Fingers;Current density;Doping;Thermal conductivity;Radio frequency;Power amplifiers;Power generation;Gain
4H-SiC BJTs with multiple finger structure were designed and fabricated. Large devices with 0.52 mm/sup 2/ active area show DC gain around 18. A class A power amplifier is designed at 450 MHz using a single cell large device. Matching at the input is done with a parallel capacitor and a transmission line. The device is biased at V/sub CE/=180 V and pulsed with 0.1 % duty cycle to avoid self-heating. A maximum output power of 215 W is achieved with a power gain of 7.5 dB, corresponding to a power density of 4.3 W/mm normalized to emitter finger length.

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