- Title
- 4-nm (AlCrTaTiZrRu)N0.5/ AlCrTaTiZrRu Bilayer Structureas Effective Diffusion Barrier for Cu Interconnect
- Creators - without role
- Shou-Yi Chang - 國立清華大學工學院材料科學工程學系Sheng-Cheng ChiangChen-En Li
- Identifiers
- 9957777348606774
- Academic Unit
- Department of Materials Science and Engineering, College of Engineering, National Tsing Hua University
- Language
- Traditional Chinese
- Resource Type
- Conference paper
- Publication Details
- Proceedings of 3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials Proceedings of 3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma), pp.206-206
Conference paper
4-nm (AlCrTaTiZrRu)N0.5/ AlCrTaTiZrRu Bilayer Structureas Effective Diffusion Barrier for Cu Interconnect
Proceedings of 3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials Proceedings of 3rd International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials (ISPlasma), pp.206-206
2011
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