Abstract
This study demonstrates a new 7T2R nonvolatile SRAM (nvSRAM) with 3D ReRAM stacked structure for normally-off computing application. With this structure, the fully performance of SRAM can work well in active mode, and reduce the leakage current in power-off mode. High performance HfOx based ReRAM is used for high speed storage element and exhibits an instant-on characteristic. The present 7T2R nvSRAM cell includes a 1T2R RRAM (1 transistor/2 resistive memory) cell and a 6T SRAM circuit, which is low area penalty and achieve the nvSRAM function. The write margin is improved over 1.03x and 1.37x larger than that of 6T SRAM and 6T2R nvSRAM. The access time and read/write power consumption in 7T2R nvSRAM is better than that of 8T2R structure. Finally, a 16 Kb macro was fabricated with a 0.18 μm TSMC FEOL and ITRI BEOL. According to the measurement result, the VDD min can be low down to 0.7 V and access time can be fast as 8.3 ns without pad delay. The data storage time is only 10 ns for SET and RESET in the ReRAM cell. © 2013 IEEE.