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A Study of Physical Unclonable Function by Dielectric Breakdown in High-κ Metal Gate Device
會議論文

A Study of Physical Unclonable Function by Dielectric Breakdown in High-κ Metal Gate Device

Geng-Shiu Lin, Ya-Chin King 和 Chrong-Jung Lin
2024 INTERNATIONAL VLSI SYMPOSIUM ON TECHNOLOGY, SYSTEMS AND APPLICATIONS, VLSI TSA
IEEE
2024 International VLSI Symposium on Technology, Systems and Applications (VLSI TSA) (HsinChu, Taiwan, 22/04/2024–25/04/2024)
04/2024
Web of Science ID: WOS:001253001400069

摘要

Engineering, Electrical & Electronic Science & Technology Engineering Technology
A complementary 3T-PUF cell is proposed and implemented by 28nm High-kappa Metal Gate (HKMG) CMOS logic process. The new PUF cell takes use of gate dielectric breakdown on either side of the center transistor arbitrarily with self-inhibit mechanism, the cell can create and store uniquely random data. A unique negative bias read achieves the clear distribution of resistive states so that it can be established. Experiments show that the complementary 3T-PUF cell provides good data stability after long-term read stress and high temperature bake. The uniqueness and randomness of PUF array are further evaluated by Hamming-Distance (HD) and following Hamming-Weight (HW).

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