A compact dual-wavelength optical head for photo-lithography

Yuan-Chin Lee; Shiuh Chao; Chun-Chieh Huang; Shuen-Chen Chen; Chung-Ta Cheng

doi:10.1109/CLEOPR.2013.6600565

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Conference paper

A compact dual-wavelength optical head for photo-lithography

Yuan-Chin Lee, Shiuh Chao, Chun-Chieh Huang, Shuen-Chen Chen and Chung-Ta Cheng

Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest, 6600565

2013

DOI: https://doi.org/10.1109/CLEOPR.2013.6600565

Abstract

A dual-wavelength optical head with an NA0.85 objective lens for lithography was developed. Both 405nm and 650nm are integrated in this optical head. It can be used to expose both organic and in-organic photo-resists and meanwhile performing focusing servo. © 2013 IEEE.

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Title: A compact dual-wavelength optical head for photo-lithography
Creators - without role: Yuan-Chin Lee - Electronics and Optoelectronics Research Laboratories , Industrial Technology Research Institute
Shiuh Chao - National Tsing Hua University
Chun-Chieh Huang - Industrial Technology Research Institute
Shuen-Chen Chen - Electronics and Optoelectronics Research Laboratories , Industrial Technology Research Institute
Chung-Ta Cheng - Industrial Technology Research Institute
Publication Details: Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest, 6600565
Identifiers: 9781467364751; 9957776830006774
Academic Unit: College of Electrical Engineering and Computer Science, National Tsing Hua University
Language: English
Resource Type: Conference paper

A compact dual-wavelength optical head for photo-lithography

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