Abstract
The proportion of the isotropic strain (ISO) in a microelectromechanical system (MEMS)-elastomer hybrid configuration was enlarged from 6.99% to 98.30% to support various applications that require not only isotropic strains but also large ISOs. This achievement was realized by relocating the applied forces in a typical MEMS configuration and by modifying the shape (cross, square, and octagon) of the elastomer attached to the MEMS. The proposed configuration significantly improved the ISO, almost completely covering the active area of interest in the elastomer. Comprehensive structural analysis revealed that the proposed configuration and its enlarged ISO enhanced the color purity of a filter based on surface plasmon resonance.