Abstract
Inspired by practical needs to improve the high-mixed run-to-run (R2R) production process control where produces with diverse recipe will be manufactured on a different or same tools because of their capacity. Due to its characteristic, the enhancement should consider control difficulty in mixed run process with low fabrication frequencies product, state assessment challenges and technician’s erroneous adjustment for better performance. This paper aims to provide a comprehensive combination structure approach run-to-run control by firstly integrated extended state observer with disturbance assessment then applied adaptive k means clustering for EWMA. Indeed, semiconductor manufacturing fab still cannot fully automatic facilities equipped such as in process parameter adjustment to develop whole productivity; the integration method can be implemented in which the validated outcome can be considered in Industry 3.5-a hybrid between current Industry 3.0 and upcoming Industry 4.0.