Analysis of the Structure and Properties of Zr(N,O) Thin Films on Si(100) Deposited by HCD-IP Method

Conference paper

K.-C Lan, J.-H. Huang and G.-P. Yu

33th International Conference on Metallurgical Coatings and Thin Films 33th International Conference on Metallurgical Coatings and Thin Films

2006

Abstract

Analysis;Structure;Properties;Zr(N,O) Thin Films;Si(100);HCD-IP Method

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Title: Analysis of the Structure and Properties of Zr(N,O) Thin Films on Si(100) Deposited by HCD-IP Method
Creators - without role: K.-C Lan
J.-H. Huang - 國立清華大學原子科學院工程與系統科學系
G.-P. Yu
Publication Details: 33th International Conference on Metallurgical Coatings and Thin Films 33th International Conference on Metallurgical Coatings and Thin Films
Identifiers: 9957768095606774
Academic Unit: Department of Engineering and System Science, College of Nuclear Science, National Tsing Hua University
Language: Traditional Chinese
Resource Type: Conference paper