Anomalous absorption of silicon nanocrystals in silicon-rich SiO1.25 matrix precipitated by CO2 laser annealing

Chun-Jung Lin; Gong-Ru Lin; Yu-Lun Chueh; Li-Jen Chou

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Anomalous absorption of silicon nanocrystals in silicon-rich SiO1.25 matrix precipitated by CO2 laser annealing

Chun-Jung Lin, Gong-Ru Lin, Yu-Lun Chueh and Li-Jen Chou

Optics InfoBase Conference Papers

2006

Abstract

The structural aspects, the luminescent and optical properties and localized synthesis of 4.2-5.6 nm-nc-Si in Si-rich SiO _1.25 film by a direct-writing CO ₂ laser rapid-thermal-annealing at the ablation threshold intensity of 5.8 kW/cm ² is demonstrated. © 2006 Optical Society of America.

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Title: Anomalous absorption of silicon nanocrystals in silicon-rich SiO1.25 matrix precipitated by CO2 laser annealing
Creators - without role: Chun-Jung Lin - Department of Photonics, Institute of Electro-Optical Engineering, National Chiao Tung University
Gong-Ru Lin - Department of Photonics, Institute of Electro-Optical Engineering, National Chiao Tung University
Yu-Lun Chueh - Department of Materials Science and Engineering, National Tsing Hua University
Li-Jen Chou - Department of Materials Science and Engineering, National Tsing Hua University
Publication Details: Optics InfoBase Conference Papers
Identifiers: 1557528071; 9781557528070; 9957768207506774
Academic Unit: Department of Materials Science and Engineering, College of Engineering, National Tsing Hua University
Language: English
Resource Type: Conference paper

Anomalous absorption of silicon nanocrystals in silicon-rich SiO1.25 matrix precipitated by CO2 laser annealing

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