Logo image
CMOS-micromachined, two-dimenisional transistor arrays for neural recording and stimulation
Conference paper

CMOS-micromachined, two-dimenisional transistor arrays for neural recording and stimulation

J.S. Lin, S.R. Chang, C.H. Chang, S.C. Lu and H. Chen
Annual International Conference of the IEEE Engineering in Medicine and Biology - Proceedings, pp.2365-2368
2007

Abstract

In-plane microelectrode arrays have proven to be useful tools for studying the connectivities and the functions of neural tissues. However, seldom microelectrode arrays are monolithically-integrated with signal-processing circuits, without which the maximum number of electrodes is limited by the compromise with routing complexity and interferences. This paper proposes a CMOS-compatible, two-dimensional array of oxide-semiconductor field-effect transistors(OSFETs), capable of both recording and stimulating neuronal activities. The fabrication of the OSFETs not only requires simply die-level, post-CMOS micromachining process, but also retains metal layers for monolithic integration with signal-processing circuits. A CMOS microsystem containing the OSFET arrays and gain-programmable recording circuits has been fabricated and tested. The preliminary testing results are presented and discussed. © 2007 IEEE.

Metrics

1 Record Views

Details

Logo image