- Title
- Comparison of bipolar bias-temperature instability on MOSFETs with HfO 2/LaOx and HfO2/AlOx dielectric stacks
- Creators - without role
- Chun-Chang Lu - National Tsing Hua UniversityKuei-Shu Chang-Liao - Department of Engineering and System Science , National Tsing Hua UniversityChe-Hao Tsao - National Tsing Hua UniversityTien-Ko Wang - Department of Engineering and System Science , National Tsing Hua University
- Publication Details
- 2009 International Semiconductor Device Research Symposium, ISDRS '09, 5378243
- Identifiers
- 9781424460304; 9957771053106774
- Academic Unit
- Institute of Nuclear Engineering and Science, College of Nuclear Science, National Tsing Hua University; National Tsing Hua University
- Language
- English
- Resource Type
- Conference paper
Conference paper
Comparison of bipolar bias-temperature instability on MOSFETs with HfO 2/LaOx and HfO2/AlOx dielectric stacks
2009 International Semiconductor Device Research Symposium, ISDRS '09, 5378243
2009
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