Defect reduction with special routing for immersion lithography

Conference paper

Fu-Jye Liang, Lin-Hung Shiu, Chun-Kuang Chen, Li-Jui Chen, Tsai-Sheng Gau and 本堅林

JM3 letter, J. Micro/Nanolith. MEMS, and MOEMS

2007

Abstract

Immersion lithography;defect reduction

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Title: Defect reduction with special routing for immersion lithography
Creators - without role: Fu-Jye Liang
Lin-Hung Shiu
Chun-Kuang Chen
Li-Jui Chen
Tsai-Sheng Gau
本堅林
Publication Details: JM3 letter, J. Micro/Nanolith. MEMS, and MOEMS
Identifiers: 9957773555706774
Academic Unit: Institute of Photonics Technologies, College of Electrical Engineering and Computer Science, National Tsing Hua University
Language: Traditional Chinese
Resource Type: Conference paper