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Conference paper
Design and fabrication of CMOS-integrated thermoelectric IR microsensors
Keng-Shuen Lin
and
Rongshun Chen
2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS, pp.106-107
2008
DOI:
https://doi.org/10.1109/OMEMS.2008.4607851
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Abstract
Electrical and Electronic Engineering
This work presents a thermoelectric infrared microsensor which is designed and fabricated with TSMC CMOS-MEMS processes. The proposed device can achieve the responsivity of 432.3 V/W and time constant of 2.49 ms at 1 atm. © 2008 IEEE.
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Title
Design and fabrication of CMOS-integrated thermoelectric IR microsensors
Creators - without role
Keng-Shuen Lin - National Tsing Hua University
Rongshun Chen - National Tsing Hua University
Identifiers
9781424419180; 9957777170906774
Academic Unit
Department of Power Mechanical Engineering, College of Engineering, National Tsing Hua University
Language
English
Resource Type
Conference paper
Publication Details
2008 IEEE/LEOS International Conference on Optical MEMS and Nanophotonics, OPT MEMS, pp.106-107
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