Development of Zirconium Oxynitride Thin Films on Si(100) by HCD-IP System and Heat Treatment

Conference paper

S. J. Wang, J.-H. Huang and G.-P. Yu

35th International Conference on Metallurgical Coatings and Thin Films 35th International Conference on Metallurgical Coatings and Thin Films

2008

Abstract

Development;Zirconium Oxynitride Thin Films;Si(100);HCD-IP System;Heat Treatment

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Title: Development of Zirconium Oxynitride Thin Films on Si(100) by HCD-IP System and Heat Treatment
Creators - without role: S. J. Wang
J.-H. Huang - 國立清華大學原子科學院工程與系統科學系
G.-P. Yu
Identifiers: 9957771070006774
Academic Unit: Department of Engineering and System Science, College of Nuclear Science, National Tsing Hua University
Language: Traditional Chinese
Resource Type: Conference paper
Publication Details: 35th International Conference on Metallurgical Coatings and Thin Films 35th International Conference on Metallurgical Coatings and Thin Films