Abstract
We developed room-temperature bonding of micro-nanofluidic device using fluorine induced plasma activation method. Fluorine was induced by O reactive ion etching (RIE) plasma treatment with Teflon Pieces which increased the bonding strength between fused silica glass substrates. The room-temperature bonded fused silica glass micro-nanofluidic device had high bonding strength as well as could work continuously without leakage during liquid introduction driven by air pressure even at 2000 kPa.