EUV APSM mask prospects and challenges

Conference paper

Shy-Jay Lin, Chien-Min Lee, Yen-Liang Chen, Kuo-Lun Tai, Lee-Feng Chen, 健朝黃 and Frankie F. G. Tsai

Proceedings of the SPIE, Vol.12751

11/2023

Abstract

EUV;attenuated phase-shift masks (APSM)

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Title: EUV APSM mask prospects and challenges
Creators - without role: Shy-Jay Lin - Taiwan Semiconductor Manufacturing Company (Taiwan)
Chien-Min Lee - Taiwan Semiconductor Manufacturing Company (Taiwan)
Yen-Liang Chen
Kuo-Lun Tai
Lee-Feng Chen - Taiwan Semiconductor Manufacturing Company (Taiwan)
健朝黃
Frankie F. G. Tsai - Taiwan Semiconductor Manufacturing Company (Taiwan)
Identifiers: 9957772421606774
Academic Unit: College of Semiconductor Research, National Tsing Hua University
Language: English
Resource Type: Conference paper
Publication Details: Proceedings of the SPIE, Vol.12751