Effect of Bias on the Structure and Properties of ZrN Thin Film by Unbalanced Magnetron Sputtering

Conference paper

Y.W Lin, J.-H. Huang and G.P. Yu

30th International Conference on Metallurgical Coatings and Thin Films 30th International Conference on Metallurgical Coatings and Thin Films

2003

Abstract

Effect;Bias;Structure;Properties;ZrN Thin Film;Unbalanced Magnetron Sputtering

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Title: Effect of Bias on the Structure and Properties of ZrN Thin Film by Unbalanced Magnetron Sputtering
Creators - without role: Y.W Lin
J.-H. Huang - 國立清華大學原子科學院工程與系統科學系
G.P. Yu
Publication Details: 30th International Conference on Metallurgical Coatings and Thin Films 30th International Conference on Metallurgical Coatings and Thin Films
Identifiers: 9957776526906774
Academic Unit: Department of Engineering and System Science, College of Nuclear Science, National Tsing Hua University
Language: Traditional Chinese
Resource Type: Conference paper