Effect of Film Thickness and Ti Interlayer on the Structure and Properties of Nanocrystalline TiN Thin Film Deposited by Unbalanced Magnetron Sputtering

Conference paper

32th International Conference on Metallurgical Coatings and Thin Films 32th International Conference on Metallurgical Coatings and Thin Films

2005

Abstract

Effect;Film Thickness;Ti Interlayer;Structure;Properties;Nanocrystalline TiN Thin Film;Unbalanced Magnetron Sputtering

1 Record Views

Title: Effect of Film Thickness and Ti Interlayer on the Structure and Properties of Nanocrystalline TiN Thin Film Deposited by Unbalanced Magnetron Sputtering
Creators - without role: J.-H. Huang - 國立清華大學原子科學院工程與系統科學系
Fan-Yi Ouyang
Ge-Ping Yu
Identifiers: 9957768958206774
Academic Unit: Department of Engineering and System Science, College of Nuclear Science, National Tsing Hua University
Language: Traditional Chinese
Resource Type: Conference paper
Publication Details: 32th International Conference on Metallurgical Coatings and Thin Films 32th International Conference on Metallurgical Coatings and Thin Films