Effect of Ion Enhance on Ti1-xAlxN Thin Films Deposited by Rf-Reactive Sputtering

Conference paper

Y.-W. Lin, J.-H. Huang and G.-P. Yu

34th International Conference on Metallurgical Coatings and Thin Films 34th International Conference on Metallurgical Coatings and Thin Films

2007

Abstract

Effect;Ion Enhance;Ti1-xAlxN Thin Films;Rf-Reactive Sputtering

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Title: Effect of Ion Enhance on Ti1-xAlxN Thin Films Deposited by Rf-Reactive Sputtering
Creators - without role: Y.-W. Lin
J.-H. Huang - 國立清華大學原子科學院工程與系統科學系
G.-P. Yu
Identifiers: 9957767090906774
Academic Unit: Department of Engineering and System Science, College of Nuclear Science, National Tsing Hua University
Language: Traditional Chinese
Resource Type: Conference paper
Publication Details: 34th International Conference on Metallurgical Coatings and Thin Films 34th International Conference on Metallurgical Coatings and Thin Films