- Title
- Effect of Plasma Treatments on the Interface Chemistry and Adhesion Strength between Porous SiO2 Low-k Film and SiC/SiN Layers
- Creators - without role
- Shou-Yi Chang - 國立清華大學工學院材料科學工程學系Yi-Chung Huang
- Identifiers
- 9957777657306774
- Academic Unit
- Department of Materials Science and Engineering, College of Engineering, National Tsing Hua University
- Language
- Traditional Chinese
- Resource Type
- Conference paper
- Publication Details
- Proceedings of ThinFilms 2006 Proceedings of ThinFilms 2006
Conference paper
Effect of Plasma Treatments on the Interface Chemistry and Adhesion Strength between Porous SiO2 Low-k Film and SiC/SiN Layers
Proceedings of ThinFilms 2006 Proceedings of ThinFilms 2006
2006
Appears in keyword about Chemistry
Metrics
1 Record Views