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Effect of nitrogen flow rate on properties of nanostructured TiZrN thin films produced by radio frequency magnetron sputtering
Conference paper   Peer reviewed

Effect of nitrogen flow rate on properties of nanostructured TiZrN thin films produced by radio frequency magnetron sputtering

Yu-Wei Lin, Jia-Hong Huang and Ge-Ping Yu
Thin Solid Films, Vol.518(24), pp.7308-7311
01/10/2010

Abstract

(Ti,Zr)N Magnetron sputtering Nitrogen flow rate
The effect of nitrogen flow rate on structure and properties of (Ti,Zr)N thin films was investigated in the study. Two types of (Ti,Zr)N thin films were found with different nitrogen flow rates, one is the single-phase solid solution of (Ti,Zr)N that appeared for nitrogen flow rates of 2-7 sccm, the other one is the phase of both (Ti,Zr)N and TiZr mixture for the lower nitrogen flow rates of 1 sccm. The grain size of the films was also determined by X-ray diffraction, and the size was less than 20 nm. The (Ti,Zr)N films show excellent hardness ranging from 35.5 to 37.5 GPa with exhibiting (111) preferred orientation. Crown Copyright © 2010 Published by Elsevier B.V. All rights reserved.

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