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Effects of ion-implantation on the formation of light-emitting FeSi 2 in Fe thin films on (0 0 1)Si
Conference paper   Peer reviewed

Effects of ion-implantation on the formation of light-emitting FeSi 2 in Fe thin films on (0 0 1)Si

H.T. Lu, L.J. Chen, L.J. Chen, Y.L. Chueh and L.J. Chou
Thin Solid Films, Vol.447-448, pp.349-353
30/01/2004

Abstract

Ion-implantation Iron silicides Phase transformation
The formation of iron silicides on (001)Si and the effects of BF 2 + -, As + - and P + -implantation on the phase transformation have been investigated. All implantation species were found to enhance the growth of light-emitting β-FeSi 2 with the effects of P + - and As + -implantation most and least pronounced, respectively. The transformation temperature from FeSi to β-FeSi 2 was lowered from 700 to 600 °C and the formation of β-FeSi 2 was completed at 700 °C. The transformation of β-FeSi 2 from FeSi was found to be by clustered growth. Grain boundaries were observed to be decorated with As atoms in the As + -implanted samples annealed at 700-800 °C. The As-rich grain boundaries disappeared after 900 °C annealing. © 2003 Elsevier B.V. All rights reserved.

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