Abstract
This work describes that vanadium oxide can be anodically deposited at potentials much more negative to oxygen evolution from aqueous VOSO 4 solutions by adding H 2 O 2 . Vanadium oxide deposit with a 3D nanonetwork architecture has been successfully deposited from VOSO 4 with the addition of H 2 O 2 . The X-ray photoelectron spectroscopic analyses reveal that this oxide deposit, mainly consisting of V 5+ with minor amount V 4+ , shows a hydrous nature (denoted as VO x .wH 2 O). The VO x .wH 2 O deposit exhibits ideal pseudocapacitive performances in 3 M KC1. © The Electrochemical Society.