Abstract
The electron beam patterning of crystalline CaF2 and Ca0.5Sr-0.5F2 thin films grown by molecular-beam epitaxy is demonstrated. The mechanism leading to patterning is the removal of fluorine through high energy electron beam exposure and dissolution of the resulting metal oxide in a water-based solution. A scanning Auger microprobe and a scanning electron microscope are used as exposing tools. The development of the films is performed either in deionized water or in a weak HCl solution. The chemical analysis of the patterned features confirms the development of small windows. The feasibility of the fabrication of micrometers features is verified. © 1992, American Vacuum Society. All rights reserved.