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Fabrication and field emission characteristic of microcrystalline diamond/carbon nanotube double-layered pyramid arrays
Conference paper   Peer reviewed

Fabrication and field emission characteristic of microcrystalline diamond/carbon nanotube double-layered pyramid arrays

Ping-Huan Tsai and Hung-Yin Tsai
Thin Solid Films, Vol.584, pp.330-335
01/06/2015

Abstract

Carbon nanotube Electron field emission Microcrystalline diamond Microwave plasma chemical vapor deposition
In this study, microcrystalline diamond (MCD)/carbon nanotube (CNT) double-layered pyramid arrays have been fabricated by microwave plasma chemical vapor deposition (MPCVD). First, the silicon template with pyramidal cavity arrays was manufactured using photolithography with anisotropic wet-etching. MCD film was then grown on the silicon template by MPCVD. After the sol-gel catalyst which contains ferric nitrate, tetrabutyl titanate and n-propanol was spun on the MCD film, CNT film was grown by MPCVD. In order to etch away the silicon template, hydrofluoric acid and nitric acid are used for 2 h. From the results, the turn-on electric field of MCD/CNT double-layered pyramid arrays is about 2.84 V/μm and lifetime over 100 h.

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