Abstract
Owning to the robust characteristics of diamonds, a nano-tip array structured mold was fabricated with diamond, we can then use this mold to produce anti-reflection (AR) films with nanoimprint lithography. Taking advantage of the self-ordered characteristic of anodic aluminum oxide (AAO), we can obtain the diamond mold by depositing a layer of diamond on the AAO using hot filament chemical vapor deposition (HFCVD). Then taking advantage of the high through-put characteristics of nanoimprint lithography, AR films can be mass produced. The AR films were subjected to reflectivity inspections, a 5.5% reduction in reflectivity was obtained. © (2012) Trans Tech Publications, Switzerland.