Abstract
Moth-eye structure (MES), biologically antireflective structure, can be regarded as an impedance-matching layer in optics. MES possesses remarkable antireflective effects and plays a big role in optoelectronic applications. The wafer-level MES achieved using chemical etching with metal catalyst has been demonstrated. The method proposed in this paper provided a rapid and simple fabrication and could be integrated with current fabrication of solar cells and light-emitted devices (LED). © 2007 IEEE.