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Ferroelectric Properties of Pb(Zr1-XTiX)O3 Graded Thin Films Prepared by Pulsed Laser Deposition Process
Conference paper   Peer reviewed

Ferroelectric Properties of Pb(Zr1-XTiX)O3 Graded Thin Films Prepared by Pulsed Laser Deposition Process

Nyan-Hwa Tai, Yu-long Lee, Cheng-Hsiung Lin and I-Nan Lin
Integrated Ferroelectrics (ISIF) Integrated Ferroelectrics (ISIF)
2002

Abstract

Pb(Zr 1 m x Ti x )O 3 , PZT, thin films, with the composition changes continuously throughout the thickness of the films, have been synthesized using pulsed laser deposition process. Graded-structured PZT films, with PZT(25/75) on top layer and PZT(52/48) on bottom layer, exhibit markedly superior ferroelectric properties, whereas the double layer structured PZT films show pronouncedly inferior ferroelectric properties to uniform-compositioned PZT (52/48) films. The modification on ferroelectric properties of these graded PZT films is presumably due to the presence of film-to-substrate interfacial stress or layer-to-layer internal stress

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