Abstract
We report heterogeneously integrated sub-40nm epi-like monolithic 3DIC with vertical ReRAM and memory computing (NMC) circuit. High driving current multi-channel UTB-MOSFETs (3.3/1.4 mA μ m for N/P FETs) was realized by low thermal budget super-CMP-planarized visible laser-crystallized epi-like Si channel and CO <sub>2</sub> far-infrared laser annealing (CO <sub>2</sub> -FIR-LA) activation technologies that enable driving 20nm 4-layer vertical ReRAM (Set/Reset < 1.2 V/1.8V, 3-bits/cell). Furthermore, the ultra-low threshold voltage of NC-FinFETs and the differential output of SRAM readout enable 50 +% area reduction in the near-memory computing circuitry. The unique TSV-free monolithic 3D <sup>+</sup> IC process provides the superiority in 3D hetero-integration to realize low cost, small footprint, fully functionalized 3D IoTs chip.