Abstract
When the k 1 number approaches 0.6 and below, optical proximity correction (OPC) is inevitable. Most existing OPC schemes correct the image in the focal plane without considering the possibility of different optimum focuses for the features to be corrected. Furthermore, OPC is often conducted without optimizing NA and σ before and after, to save experimental or simulation work. In this paper, a full-depth OPC scheme is presented. It optimizes the individual size bias of contributing features in the entire exposure-defocus space using the E-D tree methodology. In addition, the OPC scheme integrates with Signamization to fully automatically optimize NA, σ, and individual feature bias together.