Gate oxide defect localization and analysis by using conductive atomic force microscopy

Conference paper

Z. H. Lee, C. J. Lin, S. W. Lai and J. H. Chou

Conference Proceedings from the International Symposium for Testing and Failure Analysis, Vol.2005, pp.235-238

2005

Abstract

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Title: Gate oxide defect localization and analysis by using conductive atomic force microscopy
Creators - without role: Z. H. Lee
C. J. Lin
S. W. Lai
J. H. Chou
Publication Details: Conference Proceedings from the International Symposium for Testing and Failure Analysis, Vol.2005, pp.235-238
Grant note: ASM International;EDFAS, Electronic Device Failure
Identifiers: 9957771592206774
Academic Unit: National Tsing Hua University
Language: English
Resource Type: Conference paper