Globally stable Turing pattern formation in Si3N4 microresonator

Shu-Wei Huang; Jinghui Yang; Shang-Hua Yang; Mingbin Yu; Dim-Lee Kwong; Tanya Zelevinsky; Mona Jarrahi; Chee Wei Wong

doi:10.1364/CLEO_SI.2017.SW4N.4

Conference paper

Globally stable Turing pattern formation in Si3N4 microresonator

Shu-Wei Huang, Jinghui Yang, Shang-Hua Yang, Mingbin Yu, Dim-Lee Kwong, Tanya Zelevinsky, Mona Jarrahi and Chee Wei Wong

Optics InfoBase Conference Papers, Vol.Part F41-CLEO_SI 2017

2017

DOI: https://doi.org/10.1364/CLEO_SI.2017.SW4N.4

Abstract

Electronic

Optical and Magnetic Materials

Mechanics of Materials

We report efficient on-chip Turing pattern formation, uniquely enabled by modehybridization induced phase matching. Destabilization of Turing pattern is circumvented, thereby achieving unprecedented pump depletion and record high external pump-to-comb conversion efficiency of 45%.

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Title: Globally stable Turing pattern formation in Si3N4 microresonator
Translated title: Globally stable Turing pattern formation in Si3N4 microresonator
Creators - without role: Shu-Wei Huang - Quantum Group (United States)
Jinghui Yang - University of California, Los Angeles
Shang-Hua Yang - University of California, Los Angeles
Mingbin Yu - Agency for Science, Technology and Research
Dim-Lee Kwong - Institute of Microelectronics
Tanya Zelevinsky - Columbia University
Mona Jarrahi - University of California, Los Angeles
Chee Wei Wong - University of California, Los Angeles
Identifiers: 9781943580279; 9957774436406774
Academic Unit: Institute of Electronics Engineering, College of Electrical Engineering and Computer Science, National Tsing Hua University
Language: English
Resource Type: Conference paper
Publication Details: Optics InfoBase Conference Papers, Vol.Part F41-CLEO_SI 2017

Globally stable Turing pattern formation in Si3N4 microresonator

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