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High aspect ratio ultrathick micro-stencil by JSR THB-430N negative UV photoresist
Conference paper   Peer reviewed

High aspect ratio ultrathick micro-stencil by JSR THB-430N negative UV photoresist

Fan-Gang Tseng and Chih-Sheng Yu
Sensors and Actuators, A: Physical, Vol.97-98, pp.764-770
01/04/2002

Abstract

High aspect ratio micro-structures JSR Photoresist Micro-molds Micro-stencils Thick photoresist UV-LIGA
A novel way by employing JSR THB-430N negative tone resist to replace SU-8 resist for ultrathick plating mold fabrication is proposed in this paper. SU-8 is a common resist utilized for fabrication of high aspect ratio micro-structures. However, it is well known that SU-8 is hard to strip when served as a plating mold, especially in ultrathick and high aspect ratio regions. In contrast, cured THB-430N resist proposed in this paper can be softened in acetone and then easily striped by THB-S1 stripper without damage of micro-structures. Current approach using THB-430N resist can reach a structure height of 1.4 mm and an aspect ratio at least 5. Low power ultrasound has been employed to eliminate undercut problem and reduce developing time [Microsyst. Technol., in press]. Through-mold plating and PR striping of 1.4 mm thick THB-430N resist has been successfully demonstrated, and the plated thick copper structures show good structure integrity.

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