High interfacial exchange energy in TbFeCo exchange-bias films

Chao-Cheng Lin; Chih-Huang Lai; Ruo-Fan Jiang; Han-Ping D. Shieh

doi:10.1063/1.1556932

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High interfacial exchange energy in TbFeCo exchange-bias films

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High interfacial exchange energy in TbFeCo exchange-bias films

Chao-Cheng Lin, Chih-Huang Lai, Ruo-Fan Jiang and Han-Ping D. Shieh

Journal of Applied Physics, Vol.93(10 2), pp.6832-6834

15/05/2003

DOI: https://doi.org/10.1063/1.1556932

Appears in keyword about Physics

Abstract

A study to investigate high interfacial exchange energy in TbFeCo exchange-bias films was presented. The interfacial exchange energy of TbFeCo bilayers was found to be larger than 5 erg/cm ² at room temperature. Both positive and negative exchange bias were observed by varying the composition of TbFeCo layers.

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Title: High interfacial exchange energy in TbFeCo exchange-bias films
Creators - without role: Chao-Cheng Lin - Department of Materials Science , National Tsing Hua University
Chih-Huang Lai - Department of Materials Science , National Tsing Hua University
Ruo-Fan Jiang - National Tsing Hua University
Han-Ping D. Shieh - Inst. of Electro-Optical Engineering , National Chiao Tung University
Publication Details: Journal of Applied Physics, Vol.93(10 2), pp.6832-6834
Identifiers: 9957771935506774
Academic Unit: Department of Materials Science and Engineering, College of Engineering, National Tsing Hua University
Language: English
Resource Type: Conference paper

High interfacial exchange energy in TbFeCo exchange-bias films

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