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High pressure EWOD digital microfluidics
Conference paper

High pressure EWOD digital microfluidics

W.C. Nelson, M. Yen, P.Y. Keng, R.M. Van Dam and C.-J. Kim
2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11, pp.2932-2935
2011

Abstract

diffusion digital microfluidics Electrowetting-on-dielectric (EWOD) evaporation pressure chamber Hardware and Architecture Electrical and Electronic Engineering
We are developing new electrowetting-on-dielectric (EWOD) digital microfluidic systems for operating at non-atmospheric conditions. The first generation is a compact pressure chamber with an electric feed-through, enabling EWOD operation within a gaseous medium of well-controlled pressure and composition. EWOD performance is insensitive to chamber pressure because the chip is of open-channel architecture. We demonstrate two different types of previously unachievable processes - (i) controlling evaporation rates of common solvents (water, methanol, acetonitrile) by adjusting the pressure of an inert gaseous medium (N 2 ), and (ii) controlling the reaction rate of a solid-liquid-gas-phase reaction by adjusting the pressure of a gas-phase reagent (H 2 ). © 2011 IEEE.

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