Impact of mold geometries and imprinted resist thickness on velocity fields for nanoimprint lithography

Chien-Hung Lin; Rongshun Chen

doi:10.1109/IMNC.2007.4456232

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Conference paper

Impact of mold geometries and imprinted resist thickness on velocity fields for nanoimprint lithography

Chien-Hung Lin and Rongshun Chen

Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC, pp.318-319

2007

DOI: https://doi.org/10.1109/IMNC.2007.4456232

Abstract

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Electrical and Electronic Engineering

This paper investigations the effects of mold geometries and imprinted resist thickness on the polymer flow through numerical simulations during NIL. The velocity profiles, including the lateral and vertical velocities, are described and explained on single- and dual-peak deformation. Investigation of velocity field in NIL is significant because it can directly illustrate the mode of the polymer deformation, the key to determine the mechanism of nanoimprint forming.

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Title: Impact of mold geometries and imprinted resist thickness on velocity fields for nanoimprint lithography
Creators - without role: Chien-Hung Lin - Department of Power Mechanical Engineering , National Tsing Hua University, Taiwan
Rongshun Chen - National Tsing Hua University
Publication Details: Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC, pp.318-319
Identifiers: 4990247248; 9784990247249; 9957776436006774
Academic Unit: Department of Power Mechanical Engineering, College of Engineering, National Tsing Hua University
Language: English
Resource Type: Conference paper

Impact of mold geometries and imprinted resist thickness on velocity fields for nanoimprint lithography

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