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In-plane scattering patterns from a complex dielectric grating at the normal and oblique incidence
Conference paper   Peer reviewed

In-plane scattering patterns from a complex dielectric grating at the normal and oblique incidence

Yu-Bin Chen, I-Chuan Ho, Feng-Cheng Chiu and Chia-Sheng Chang
Journal of the Optical Society of America A: Optics and Image Science, and Vision, Vol.31(4), pp.879-885
04/2014

Abstract

Atomic and Molecular Physics and Optics Electronic Optical and Magnetic Materials Computer Vision and Pattern Recognition
The in-plane scattering patterns from a complex dielectric grating were both numerically and experimentally studied in contrast to those from well-known metallic gratings. The incidence was the transverse electric or transverse magnetic wave of wavelength ? - 660 nm. The grating profile was complex with a period ? - 7.0 ?m, while the material was lightly doped crystalline silicon. Patterns of the electric field, magnetic field, and spatial intensity distribution were demonstrated at the normal (?i - 0°) and oblique (?i -30°) incidence. Electric and magnetic fields were presented in the near field as well as the far field. The measured power ratio within ?90° ? ?r ? -90° was plotted. Their major peaks and the numerically obtained diffraction efficiency of 21 orders (?10 ? m ? -10 or ?15 ? m ? -5) of diffracted waves occurred at the same ?r . Other peaks and stair-like shoulders of major peaks also exhibited in spectra. © 2014 Optical Society of America.

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