Influence of substrate temperature on the microstructure and properties of ultrananocrystalline diamond films prepared using Ar/CH4 plasma

Conference paper

K. J. Sankaran, P. T. Joseph, H. C. Chen, N. H. Tai and I. N. Lin

2011 AVS International Plasma Workshop 2011 AVS International Plasma Workshop

2011

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Title: Influence of substrate temperature on the microstructure and properties of ultrananocrystalline diamond films prepared using Ar/CH4 plasma
Creators - without role: K. J. Sankaran
P. T. Joseph
H. C. Chen
N. H. Tai - 國立清華大學工學院材料科學工程學系
I. N. Lin
Publication Details: 2011 AVS International Plasma Workshop 2011 AVS International Plasma Workshop
Identifiers: 9957775926306774
Academic Unit: Institute of Analytical and Environmental Sciences, College of Nuclear Science, National Tsing Hua University
Language: Traditional Chinese
Resource Type: Conference paper