- Title
- Integration of TiN/MoN and high-k dielectric gate stacks in MOS devices
- Creators - without role
- Chung-Hao FuKuei-Shu Chang-Liao - 國立清華大學原子科學院工程與系統科學系Hsueh-Yueh LuChen-Chien LeeTien-Ko Wang
- Identifiers
- 9957775392406774
- Academic Unit
- Institute of Nuclear Engineering and Science, College of Nuclear Science, National Tsing Hua University
- Language
- Traditional Chinese
- Resource Type
- Conference paper
Conference paper
Integration of TiN/MoN and high-k dielectric gate stacks in MOS devices
2009
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