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Interaction Influence of S/D GeSi Lattice Mismatch and Stress Gradient of CESL on Nano-Scaled Strained NMOSFETs
Conference paper

Interaction Influence of S/D GeSi Lattice Mismatch and Stress Gradient of CESL on Nano-Scaled Strained NMOSFETs

C. C. Lee, P. C. Huang, Y. T. Kuo, D. Y. Li and C. H. Liu
7thInternational Symposium on Control of Semiconductor Interfaces (ISCSI-VII) 7thInternational Symposium on Control of Semiconductor Interfaces (ISCSI-VII)
2016

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