- Title
- Investigation of Consequent Process-Induced Stress for NMOSFET with a Sunken STI Pattern
- Creators - without role
- C. C. Lee - 國立清華大學工學院動力機械工程學系C. H. LiuR. H. DengH. W. HsuT. L. Tzeng
- Publication Details
- 6th International Symposium on Control of Semiconductor Interfaces (ISCSI-VI) 6th International Symposium on Control of Semiconductor Interfaces (ISCSI-VI)
- Identifiers
- 9957769904806774
- Academic Unit
- Department of Power Mechanical Engineering, College of Engineering, National Tsing Hua University
- Language
- Traditional Chinese
- Resource Type
- Conference paper
Conference paper
Investigation of Consequent Process-Induced Stress for NMOSFET with a Sunken STI Pattern
6th International Symposium on Control of Semiconductor Interfaces (ISCSI-VI) 6th International Symposium on Control of Semiconductor Interfaces (ISCSI-VI)
2013
Metrics
1 Record Views