Lithography for manufacturing of sub-65nm nodes and beyond

Burn J. Lin

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Conference paper

Lithography for manufacturing of sub-65nm nodes and beyond

Burn J. Lin

Technical Digest - International Electron Devices Meeting, IEDM, Vol.2005, pp.48-51

2005

Appears in keyword about Physics

Abstract

Electronic

Optical and Magnetic Materials

Condensed Matter Physics

Electrical and Electronic Engineering

Materials Chemistry

Lithography is facing unprecedented difficulties to go beyond the 65-nm node with 90-nm half pitch. This presentation shows the types of lithography combined with necessary resolution enhancement techniques to handle the 65-, 45-, 32-, and 22-nm nodes. The pros and cons, feasibility for manufacturing, and economical impacts of these technologies will be compared. © 2005 IEEE.

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Title: Lithography for manufacturing of sub-65nm nodes and beyond
Translated title: Lithography for manufacturing of sub-65nm nodes and beyond
Creators - without role: Burn J. Lin - Taiwan Semiconductor Manufacturing Company , Hsinchu Science Park
Publication Details: Technical Digest - International Electron Devices Meeting, IEDM, Vol.2005, pp.48-51
Identifiers: 078039268X; 9780780392687; 9957775853106774
Academic Unit: Institute of Photonics Technologies, College of Electrical Engineering and Computer Science, National Tsing Hua University
Language: English
Resource Type: Conference paper

Lithography for manufacturing of sub-65nm nodes and beyond

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