MULTI-LAYER RESIST SYSTEMS AS A MEANS TO SUBMICRON OPTICAL LITHOGRAPHY.

Conference paper

Technical Digest - International Electron Devices Meeting, pp.391-394

1982

Abstract

Electronic

Optical and Magnetic Materials

Condensed Matter Physics

Electrical and Electronic Engineering

Materials Chemistry

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Title: MULTI-LAYER RESIST SYSTEMS AS A MEANS TO SUBMICRON OPTICAL LITHOGRAPHY.
Translated title: MULTI-LAYER RESIST SYSTEMS AS A MEANS TO SUBMICRON OPTICAL LITHOGRAPHY.
Creators - without role: B.J. Lin - IBM Research - Thomas J. Watson Research Center
Publication Details: Technical Digest - International Electron Devices Meeting, pp.391-394
Identifiers: 9957776620606774
Academic Unit: Institute of Photonics Technologies, College of Electrical Engineering and Computer Science, National Tsing Hua University
Language: English
Resource Type: Conference paper