Mask Cost and Cycle Time Reduction

H.C. Hsieh; Johnson Hung; Angus Chin; S.C. Lee; J.J. Shin; R.G. Liu; Burn Lin

doi:10.1117/12.504288

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Conference paper

Mask Cost and Cycle Time Reduction

H.C. Hsieh, Johnson Hung, Angus Chin, S.C. Lee, J.J. Shin, R.G. Liu and Burn Lin

Proceedings of SPIE - The International Society for Optical Engineering, Vol.5130, pp.4-15

2003

DOI: https://doi.org/10.1117/12.504288

Appears in keyword about Physics

Abstract

Defect control

Mask cost

Mask cycle time

Mask technology

Mask technology roadmap

Electronic

Optical and Magnetic Materials

Condensed Matter Physics

Computer Science Applications

Applied Mathematics

Electrical and Electronic Engineering

The mask cost and cycle time reduction in the IC industry was discussed. It was found that as the critical dimension (CD) shrinks, the optical exposure tools do not extend to a shorter wavelength and in such sub-wavelength technology generation, the mask error factor (MEF) is higher. The higher MEF means tighter mask specification is required to sustain the lithography performance. It was observed that the tighter mask specification will impact both mask processing complexity and cost.

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Title: Mask Cost and Cycle Time Reduction
Translated title: Mask Cost and Cycle Time Reduction
Creators - without role: H.C. Hsieh - Taiwan Semiconductor Manufacturing Company (Taiwan)
Johnson Hung - Taiwan Semiconductor Manufacturing Company (Taiwan)
Angus Chin - Taiwan Semiconductor Manufacturing Company (Taiwan)
S.C. Lee - Taiwan Semiconductor Manufacturing Company (Taiwan)
J.J. Shin - Taiwan Semiconductor Manufacturing Company (Taiwan)
R.G. Liu - Taiwan Semiconductor Manufacturing Company (Taiwan)
Burn Lin - Taiwan Semiconductor Manufacturing Company (Taiwan)
Publication Details: Proceedings of SPIE - The International Society for Optical Engineering, Vol.5130, pp.4-15
Identifiers: 9957769726106774
Academic Unit: Institute of Photonics Technologies, College of Electrical Engineering and Computer Science, National Tsing Hua University
Language: English
Resource Type: Conference paper

Mask Cost and Cycle Time Reduction

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