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Mechanical Property Effects of Si1-xGex Channel and Stressed CESL on Nano-Scaled nMOSFETs
Conference paper

Mechanical Property Effects of Si1-xGex Channel and Stressed CESL on Nano-Scaled nMOSFETs

C. C. Lee, C. H. Liu, H. W. Hsu, Z. H. Chen, H. H. Teng and Y. J. Lai
8th International Conference on Silicon Epitaxy and Heterostructures (ICSI-8) 8th International Conference on Silicon Epitaxy and Heterostructures (ICSI-8)
2013

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