Metallic Source/Drain Schottky Barrier Nanowire Transistors Using Rapid Thermal Annealed Silicidation

Conference paper

Metallic Source/Drain Schottky Barrier Nanowire Transistors Using Rapid Thermal Annealed Silicidation

Ming-Kun Huang, Jr-Jie Tsai, Wen-Fa Wu and Chun-Hsing Shih

2015

Abstract

Metallic Source/Drain Schottky Barrier Nanowire Transistors;Rapid Thermal Annealed Silicidation

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Title: Metallic Source/Drain Schottky Barrier Nanowire Transistors Using Rapid Thermal Annealed Silicidation
Creators - without role: Ming-Kun Huang
Jr-Jie Tsai
Wen-Fa Wu - 國立清華大學原子科學院工程與系統科學系
Chun-Hsing Shih
Identifiers: 9957774683706774
Academic Unit: Department of Engineering and System Science, College of Nuclear Science, National Tsing Hua University
Language: Traditional Chinese
Resource Type: Conference paper