Abstract
In modern semiconductor industry, ultra-clean environment is increasingly desired. Controlling ammonia gas concentration in a clean room is particularly important for fine patterning process because ammonia is a basic gas that can form salt with acidic gases and the salts deposited on a photomask turn into haze and deteriorates photo-patterning. In the next decade, control of ammonia concentration in 0.1 ppb level will be required. A discussion covers a sensitive and fast analysis method on a microchip for ammonia gas utilizing microchip technology; basic performance of the proposed method; and gas/liquid adsorption and concentration. This is an abstract of a paper presented at the 42nd Loss Prevention Symposium (New Orleans, LA 4/6-10/2008).